发明名称 Method of forming a photodiode that reduces the effects of surface recombination sites
摘要 The loss of photogenerated electrons to surface electron-hole recombination sites is minimized by utilizing a first p-type surface region to form a depletion region that functions as a first barrier that repels photogenerated electrons from the surface recombination sites, and a second p-type surface region that provides a substantial change in the dopant concentration.
申请公布号 US7642116(B1) 申请公布日期 2010.01.05
申请号 US20060476525 申请日期 2006.06.28
申请人 NATIONAL SEMICONDUCTOR CORPORATION 发明人 HOPPER PETER J.;MIAN MICHAEL;DRURY ROBERT
分类号 H01L31/113 主分类号 H01L31/113
代理机构 代理人
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