发明名称 |
Methods for monitoring and adjusting focus variation in a photolithographic process using test features printed from photomask test pattern images; and machine readable program storage device having instructions therefore |
摘要 |
Systems and methods are provided for detecting focus variation in a lithographic process using photomasks having test patterns adapted to print test features with critical dimensions that can be measured and analyzed to determine magnitude and direction of defocus from a best focus position of an exposure tool during the lithographic process.
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申请公布号 |
US7642019(B2) |
申请公布日期 |
2010.01.05 |
申请号 |
US20060324739 |
申请日期 |
2006.01.03 |
申请人 |
SAMSUNG ELECTRONICS CO., LTD. |
发明人 |
KIM HO-CHUL |
分类号 |
G03F7/207;G01B11/00;G06G7/48 |
主分类号 |
G03F7/207 |
代理机构 |
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代理人 |
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主权项 |
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地址 |
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