| 摘要 |
A semiconductor integrated circuit includes a semiconductor substrate, one or more wells formed in the semiconductor substrate, one or more diffusion layers formed in the one or more wells, a plurality of interconnects formed in an interconnect layer, the one or more diffusion layers and the plurality of interconnects being connected in series to provide a coupling between a first potential and a second potential, and a comparison circuit coupled to one of the interconnects set at a third potential between the first potential and the second potential, and configured to compare the third potential with a reference potential, wherein a first interconnect of the plurality of interconnects that is set to the first potential is connected to at least a first well of the one or more wells and connected to a first diffusion layer of the one or more diffusion layers that is formed in the first well.
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