发明名称 Polymer, top coating layer, top coating composition and immersion lithography process using the same
摘要 A polymer, a top coating layer, a top coating composition and an immersion lithography process using the same are disclosed. The top coating layer polymer may include a deuterated carboxyl group having a desired acidity such that the top coating layer polymer may be insoluble with water and a photoresist, and soluble in a developer. The polymer may be included in a top coating layer and a top coating composition.
申请公布号 US7642042(B2) 申请公布日期 2010.01.05
申请号 US20060585082 申请日期 2006.10.24
申请人 SAMSUNG ELECTRONICS CO., LTD. 发明人 HATA MITSUHIRO;CHOI SANG-JUN;WOO SANG-GYUN;RYOO MAN-HYOUNG
分类号 G03F7/11;G03F7/30 主分类号 G03F7/11
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