发明名称 |
Polymer, top coating layer, top coating composition and immersion lithography process using the same |
摘要 |
A polymer, a top coating layer, a top coating composition and an immersion lithography process using the same are disclosed. The top coating layer polymer may include a deuterated carboxyl group having a desired acidity such that the top coating layer polymer may be insoluble with water and a photoresist, and soluble in a developer. The polymer may be included in a top coating layer and a top coating composition.
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申请公布号 |
US7642042(B2) |
申请公布日期 |
2010.01.05 |
申请号 |
US20060585082 |
申请日期 |
2006.10.24 |
申请人 |
SAMSUNG ELECTRONICS CO., LTD. |
发明人 |
HATA MITSUHIRO;CHOI SANG-JUN;WOO SANG-GYUN;RYOO MAN-HYOUNG |
分类号 |
G03F7/11;G03F7/30 |
主分类号 |
G03F7/11 |
代理机构 |
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代理人 |
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主权项 |
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地址 |
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