STYRENE BUTADIENE STYRENE BLOCK COPOLYMER BASED ADHESIVE COMPOSITIONS WITH IMPROVED PHOTO-OXIDATION RESISTANCE

摘要

THE INSTANT INVENTION RELATES TO STYRENE BUTADIENE STYRENE BASED PRESSURE SENSITIVE ADHESIVE COMPOSITIONS WITH IMPROVED PHOTO-OXIDATION RESISTANCE CONTAINING N-METHYL SUBSTITUTED STERICALLY HINDERED AMINES AS STABILIZERS. FURTHER ASPECTS OF THE INVENTION ARE A PROCESS FOR THE STABILIZATION OF BUTADIENE BASED PRESSURE SENSITIVE ADHESIVE COMPOSITIONS AND THE USE OF N-METHYL SUBSTITUTED STERICALLY HINDERED AMINES AS STABILIZERS FOR STYRENE BUTACLIENE STYRENE BASED PRESSURE SENSITIVE ADHESIVES. D (05@A