发明名称 |
Film Deposition Apparatus, Film Deposition Method, and Computer Readable Storage Medium |
摘要 |
A disclosed film deposition apparatus includes a turntable having in one surface a substrate receiving portion along a turntable rotation direction; a first reaction gas supplying portion for supplying a first reaction gas; a second reaction gas supplying portion for supplying a second reaction gas; a separation area between a first process area where the first reaction gas is supplied and a second process area where the second reaction gas is supplied, the separation area including a separation gas supplying portion for supplying a first separation gas in the separation area, and a ceiling surface opposing the one surface to produce a thin space; a center area having an ejection hole for ejecting a second separation gas along the one surface; and an evacuation opening for evacuating the chamber.
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申请公布号 |
US2009324826(A1) |
申请公布日期 |
2009.12.31 |
申请号 |
US20080147707 |
申请日期 |
2008.06.27 |
申请人 |
KATO HITOSHI;HONMA MANABU;DIP ANTHONY |
发明人 |
KATO HITOSHI;HONMA MANABU;DIP ANTHONY |
分类号 |
C23C16/455;C23C16/00 |
主分类号 |
C23C16/455 |
代理机构 |
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代理人 |
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主权项 |
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地址 |
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