发明名称 |
Arrangement for reflection of heat radiation, process of making same and uses of same |
摘要 |
The heat reflecting arrangement with an improved high heat resistance, e.g. 100 hours at 500° C., includes a substrate, a heat reflecting layer (A) on at least one side of the substrate, which contains indium tin oxide (ITO), and a barrier layer (B) that covers the heat reflecting layer (A), which contains a metal oxide and/or a metal nitride. A fireplace or baking oven with a viewing window having this layer system with the heat reflecting layer is also described. In addition a process for providing the heat reflecting arrangement is described.
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申请公布号 |
US2009320824(A1) |
申请公布日期 |
2009.12.31 |
申请号 |
US20090493363 |
申请日期 |
2009.06.29 |
申请人 |
HENN CHRISTIAN;SCHMIDBAUER WOLFGANG;GABELMANN TORSTEN |
发明人 |
HENN CHRISTIAN;SCHMIDBAUER WOLFGANG;GABELMANN TORSTEN |
分类号 |
F24B1/18;A21B1/00;C23C14/34;G02B5/08 |
主分类号 |
F24B1/18 |
代理机构 |
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代理人 |
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主权项 |
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地址 |
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