发明名称 Arrangement for reflection of heat radiation, process of making same and uses of same
摘要 The heat reflecting arrangement with an improved high heat resistance, e.g. 100 hours at 500° C., includes a substrate, a heat reflecting layer (A) on at least one side of the substrate, which contains indium tin oxide (ITO), and a barrier layer (B) that covers the heat reflecting layer (A), which contains a metal oxide and/or a metal nitride. A fireplace or baking oven with a viewing window having this layer system with the heat reflecting layer is also described. In addition a process for providing the heat reflecting arrangement is described.
申请公布号 US2009320824(A1) 申请公布日期 2009.12.31
申请号 US20090493363 申请日期 2009.06.29
申请人 HENN CHRISTIAN;SCHMIDBAUER WOLFGANG;GABELMANN TORSTEN 发明人 HENN CHRISTIAN;SCHMIDBAUER WOLFGANG;GABELMANN TORSTEN
分类号 F24B1/18;A21B1/00;C23C14/34;G02B5/08 主分类号 F24B1/18
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