SUBSTRATE TREATMENT APPARATUS

摘要

A substrate treatment apparatus includes: a substrate holding unit horizontally holding a substrate; a substrate rotating unit rotating the substrate held by the substrate holding unit around a vertical axis of rotation; a treatment solution supply unit for supplying a treatment solution to the substrate rotated by the substrate rotating unit; an exhaust tub having an exhaust port and storing the substrate holding unit therein; a plurality of guards stored in the exhaust tub and vertically movable independently of one another; an exhaust passage forming unit forming a capture port opposed to the peripheral edge portion of the substrate held by the substrate holding unit for capturing the treatment solution splashing from the substrate while forming an exhaust passage reaching the exhaust port from the capture port by vertically moving the guards; and an exhaust pipe connected to the exhaust port for exhausting the atmosphere in the exhaust tub through the exhaust port.