发明名称 Method for determining position of structure on substrate, involves correcting scale failure by measurement of structure position on upper surface of substrate, so that adequate correction is retrieved from computer based on actual pressure
摘要 <p>The method involves utilizing a shape of elements for position measurement in an X/Y plane in relation to the determination of 3-dimensional space as a function of an ambiance air pressure. A dimensional change is recorded in a data processor as the function of the ambiance air pressure. A scale error is caused by a change of the ambiance air pressure, where the scale failure is corrected by the measurement of the position of a structure on an upper surface of a substrate (2), so that an adequate correction is retrieved from the computer based on the actual measured ambiance air pressure. An independent claim is also included for a coordinate measuring machine comprising a data storing device.</p>
申请公布号 DE102008030153(A1) 申请公布日期 2009.12.31
申请号 DE20081030153 申请日期 2008.06.27
申请人 VISTEC SEMICONDUCTOR SYSTEMS GMBH 发明人 HEIDEN, MICHAEL;RINN, KLAUS
分类号 G01B11/03 主分类号 G01B11/03
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