发明名称 |
CATHODE SUBSTRATE HAVING CATHODE ELECTRODE LAYER, INSULATOR LAYER, AND GATE ELECTRODE LAYER FORMED THEREON |
摘要 |
A cathode substrate according to the present invention comprises a cathode electrode layer (12), insulator layer (14) and gate electrode layer (15) formed sequentially on a substrate to be processed (11). The insulator layer includes a hole (14a) formed therethrough. A gate aperture (16) is formed through the gate electrode layer. An emitter (E) is then provided at the bottom of the hole (14a). In this case, the gate aperture comprises a plurality of openings (16a), the total area of which is smaller than the area of top opening of the hole in the insulator layer. The openings are arranged densely at a position opposite to the emitter and just above the hole of the insulator layer.
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申请公布号 |
US2009325452(A1) |
申请公布日期 |
2009.12.31 |
申请号 |
US20090538354 |
申请日期 |
2009.08.10 |
申请人 |
ULVAC, INC. |
发明人 |
NAKANO HARUHISA;HIRAKAWA MASAAKI;MIURA OSAMU;MURAKAMI HIROHIKO;OKASAKA KENSUKE;KOJIMA TOMOAKI |
分类号 |
H01J9/02;H01J9/12;H01J1/304;H01J3/02;H01J29/48;H01J31/12;H01L29/76 |
主分类号 |
H01J9/02 |
代理机构 |
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代理人 |
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主权项 |
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地址 |
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