发明名称 CATHODE SUBSTRATE HAVING CATHODE ELECTRODE LAYER, INSULATOR LAYER, AND GATE ELECTRODE LAYER FORMED THEREON
摘要 A cathode substrate according to the present invention comprises a cathode electrode layer (12), insulator layer (14) and gate electrode layer (15) formed sequentially on a substrate to be processed (11). The insulator layer includes a hole (14a) formed therethrough. A gate aperture (16) is formed through the gate electrode layer. An emitter (E) is then provided at the bottom of the hole (14a). In this case, the gate aperture comprises a plurality of openings (16a), the total area of which is smaller than the area of top opening of the hole in the insulator layer. The openings are arranged densely at a position opposite to the emitter and just above the hole of the insulator layer.
申请公布号 US2009325452(A1) 申请公布日期 2009.12.31
申请号 US20090538354 申请日期 2009.08.10
申请人 ULVAC, INC. 发明人 NAKANO HARUHISA;HIRAKAWA MASAAKI;MIURA OSAMU;MURAKAMI HIROHIKO;OKASAKA KENSUKE;KOJIMA TOMOAKI
分类号 H01J9/02;H01J9/12;H01J1/304;H01J3/02;H01J29/48;H01J31/12;H01L29/76 主分类号 H01J9/02
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