VACUUM PROCESSING APPARATUS

摘要

The present invention relates to a vacuum processing apparatus, more particularly to a vacuum processing apparatus which performs vacuum processes such as etching and deposition for a substrate of glass for an LCD panel, etc. The disclosed vacuum processing apparatus includes: a chamber body and an upper lid which are attached to each other and form a processing space performing vacuum processes for the substrate, a shower head part which is installed on the lower side of the upper lid and supplies gas to the processing space, and a spare lid which is installed between the chamber body and the upper lid to support the edge of the shower head part.