| 发明名称 |
DETERGENT FOR REMOVING PHOTORESIST |
| 摘要 |
<p>A detergent for removing photoresist includes quaternary ammonium hydroxide, water, aryl alcohol, dimethyl sulphoxide, corrosion inhibitor of polyacrylic acid. The detergent may clean photoresist and other residues on metal, metal alloy and dielectric substrate.</p> |
| 申请公布号 |
WO2009155782(A1) |
申请公布日期 |
2009.12.30 |
| 申请号 |
WO2009CN00624 |
申请日期 |
2009.06.03 |
| 申请人 |
ANJI MICROELECTRONICS (SHANGHAI) CO., LTD.;PENG, LIBBERT, HONGXIU |
发明人 |
PENG, LIBBERT, HONGXIU |
| 分类号 |
G03F7/42;C11D1/83;H01L21/02 |
主分类号 |
G03F7/42 |
| 代理机构 |
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代理人 |
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| 主权项 |
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| 地址 |
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