发明名称 Distributor Base
摘要 The invention relates to a distributor bottom (1), particularly a nozzle-type distributor bottom, for steadily introducing process gas, especially process gas loaded with solid particles, into a process chamber (3), optionally to create a fluidized bed, said process chamber (3) being disposed above the distributor bottom and being formed by walls of a reactor used for metallurgically, particularly thermally, treating feedstock. The inventive distributor bottom is provided with a plurality of holes. Holes are arranged near the walls to prevent substances from attaching to the reactor walls. Special arrangements relate to nozzles and ducts.
申请公布号 ZA200805946(B) 申请公布日期 2009.12.30
申请号 ZA20080005946 申请日期 2006.12.20
申请人 SIEMENS VAI METALS TECHNOLOGIES GMBH & CO.;POSCO 发明人 CHO, MINYOUNG;CHOI, NAG JOON;HAUZENBERGER, FRANZ;JEONG, SUN-KWANG;KIM, HANG GOO;LEE, JUN HYUK;NAMKUNG, WON;SHIN, MYOUNG KYUN;ZEHETBAUER, KARL
分类号 B01J 主分类号 B01J
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