发明名称 MONITOR, METHOD OF MONITORING, POLISHING DEVICE, AND METHOD OF MANUFACTURING SEMICONDUCTOR WAFER
摘要 The end portion on the side of the second end surface of the first optical fiber 62 is inserted into the inner race in the central part of the roll-bearing type bearing 36, and is fastened to this inner race. The fastening position of this end surface on the side of the second end surface is adjusted to match a specified position on the axis of rotation 11 in order to emit probe ligh t and allow the incidence of the reflected signal light. The probe light emitted from the second end surface of the second optical fiber 61 passes through the transparent window 23 and is caused to illuminate the polished surface of the substrate 42. The reflected signal light that is reflected from this point again passes through the transparent window 23 in the opposite direction, and is incident on the second end surface of the second optical fiber 61. Thus, even in cases where monitoring is performed in an operating state in which the polishing surface plate of the polishing apparatus is rotating, the first optical fiber 62 can be kept in a non-rotating state; as a result, the light source 24, beam splitter 25, light detector 26 and first light-coupling lens 63, which require installation space, can be installed in non-rotating positions. <IMAGE>
申请公布号 EP1255286(A4) 申请公布日期 2009.12.30
申请号 EP20000981828 申请日期 2000.12.19
申请人 NIKON CORPORATION 发明人 SUGIYAMA, YOSHIKAZU;OHUCHI, YASUSHI
分类号 G01B11/30;H01L21/304;B24B37/013;B24B49/04;B24B49/12;B24D7/12 主分类号 G01B11/30
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