发明名称 PRINT PROCESSING FOR PATTERNED CONDUCTOR, SEMICONDUCTOR AND DIELECTRIC MATERIALS
摘要 Embodiments relate to printing features from an ink containing a material precursor. In some embodiments, the material includes an electrically active material, such as a semiconductor, a metal, or a combination thereof. In another embodiment, the material includes a dielectric. The embodiments provide improved printing process conditions that allow for more precise control of the shape, profile and dimensions of a printed line or other feature. The composition(s) and/or method(s) improve control of pinning by increasing the viscosity and mass loading of components in the ink. An exemplary method thus includes printing an ink comprising a material precursor and a solvent in a pattern on the substrate; precipitating the precursor in the pattern to form a pinning line; substantially evaporating the solvent to form a feature of the material precursor defined by the pinning line; and converting the material precursor to the patterned material.
申请公布号 WO2008137811(A3) 申请公布日期 2009.12.30
申请号 WO2008US62586 申请日期 2008.05.03
申请人 KOVIO, INC.;SCHER, ERIK;KAMATH, ARVIND;ROCKENBERGER, JOERG;MORI, IKUO;MOLESA, STEVEN 发明人 SCHER, ERIK;KAMATH, ARVIND;ROCKENBERGER, JOERG;MORI, IKUO;MOLESA, STEVEN
分类号 H01L21/00;H01L21/84 主分类号 H01L21/00
代理机构 代理人
主权项
地址