| 摘要 |
PURPOSE: A photo mask test method is provided to improve quality of a photo mask by verifying a second patterning process using a mask job data for stepper. CONSTITUTION: An arrangement plan of a design layout includes a main cell region and a frame region. A phase shift film pattern and a light shielding film pattern are formed on a substrate(300) through a first patterning process. A monitoring pattern is formed by exposing a part of the phase shift film pattern through a second patterning process. A dark region and a clear region are set by light calibration. Bias difference is controlled in order to make the monitoring pattern and a second patterning design data(400) identical. A foreign material on the monitoring pattern is tested.
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