发明名称 |
Rework process for photoresist film |
摘要 |
There is disclosed a rework process for a photoresist film over a substrate having at least a first antireflection silicone resin film and the photoresist film over the first silicone resin film comprising: at least removing the photoresist film with a solvent while leaving the first silicone resin film unremoved; forming a second antireflection silicone resin film over the first silicone resin film; and forming a photoresist film again over the second silicone resin film. There can be provided a rework process for a photoresist film that can be conducted more easily at lower cost and provide more certainly an excellent resist pattern.
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申请公布号 |
US7638268(B2) |
申请公布日期 |
2009.12.29 |
申请号 |
US20060594937 |
申请日期 |
2006.11.09 |
申请人 |
SHIN-ESTU CHEMICAL CO., LTD. |
发明人 |
OGIHARA TSUTOMU;UEDA TAKAFUMI |
分类号 |
G03F7/00;G03F1/00;G03F7/004;G03F7/11;H01L21/027 |
主分类号 |
G03F7/00 |
代理机构 |
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代理人 |
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主权项 |
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地址 |
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