发明名称 A CYLINDRICAL REACTOR WITH AN EXTENDED FOCAL REGION
摘要 An elliptical exposure chamber has an extended focal region. A plurality of cylindrical reactors (25) form the ex-tended focal region. Reducing the size of the opening (58) to each reacto r (25) reduces the amount of energy reflected and increases the overall heating. In order to efficiently deliver the electromagnetic energy to the reduced opening (58), a tapered waveguide (55) has a concave end (56). A power splitter (42) divides power from a central waveguide (52) to the plurality of reactors (25). The power that is delivered to each reactor (25) can be adjusted by adjusting th e impedance of each reactor (25), the width of each reactor (25) or the width of the opening (58) to each reactor (25). The width of the opening (58) to each reactor (25) can be controlled by a movable metal plate (44). A dielectric wheel can be used to shift hot spots along the focal region.
申请公布号 CA2394019(C) 申请公布日期 2009.12.29
申请号 CA20002394019 申请日期 2000.12.07
申请人 INDUSTRIAL MICROWAVE SYSTEMS, INC. 发明人 DROZD, MICHAEL J.;JOINES, WILLIAM T.
分类号 H05B6/70;H05B6/74;H05B6/80 主分类号 H05B6/70
代理机构 代理人
主权项
地址