发明名称 Substrate via patterns for optimal power distribution and manufacturability in semiconductor die packages
摘要 The embodiments of the present invention provide methods for choosing a via layout pattern(s) for power distribution network in a package for a semiconductor die. The chosen via layout pattern allows the power distribution network to meet the limitation on the loop inductance in order to avoid causing a large DeltaV affecting the functionality of semiconductor devices on the die. In addition, the chosen via layout pattern also meets the limitation of total number of vias allowed for the power distribution network in the package.
申请公布号 US7640523(B1) 申请公布日期 2009.12.29
申请号 US20070747189 申请日期 2007.05.10
申请人 ALTERA CORPORATION 发明人 SHI HONG;YEW YEE HUAN
分类号 G06F17/50;G06F9/45 主分类号 G06F17/50
代理机构 代理人
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