| 摘要 |
PURPOSE: A substrate cleaning apparatus is provided to effectively clean the periphery of a substrate by distributing a cleaning force into a diametric direction through a state change part of a brush. CONSTITUTION: A substrate holding device rotatably holds a substrate. A cleaning solution supply device(10) supplies a cleaning solution to the substrate held to the substrate holding device. A cleaning apparatus(20) includes a brush(21) and a pressing device. The brush has a periphery cleaning part. The periphery cleaning part is contacted with the periphery of the substrate. The pressing device presses the periphery cleaning part to the periphery of the substrate. The periphery cleaning part has a state change part. A state of the state change part is changed according to a diametric direction in order to distribute a cleaning force into the diametric direction.
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