发明名称 Resistive memory cells and devices having asymmetrical contacts
摘要 A memory cell includes a plug-type first electrode in a substrate, a magneto-resistive memory element disposed on the first electrode, and a second electrode disposed on the magneto-resistive memory element opposite the first electrode. The second electrode has an area of overlap with the magneto-resistive memory element that is greater than an area of overlap of the first electrode and the magneto-resistive memory element. The first surface may, for example, be substantially circular and have a diameter less than a minimum planar dimension (e.g., width) of the second surface. The magneto-resistive memory element may include a colossal magneto-resistive material, such as an insulating material with a perovskite phase and/or a transition metal oxide.
申请公布号 US7639521(B2) 申请公布日期 2009.12.29
申请号 US20060378945 申请日期 2006.03.17
申请人 SAMSUNG ELECCTRONICS CO., LTD. 发明人 BAEK IN-GYU;LEE MOON-SOOK;KIM DONG-CHUL
分类号 G11C11/00 主分类号 G11C11/00
代理机构 代理人
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