| 发明名称 |
Multi-layer spectral purity filter, lithographic apparatus including such a spectral purity filter, device manufacturing method, and device manufactured thereby |
| 摘要 |
A multi-layered spectral purity filter improves the spectral purity of extreme ultra-violet (EUV) radiation and also collects debris emitted from a radiation source.
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| 申请公布号 |
US7639418(B2) |
申请公布日期 |
2009.12.29 |
| 申请号 |
US20080073128 |
申请日期 |
2008.02.29 |
| 申请人 |
ASML NETHERLANDS B.V. |
发明人 |
BANINE VADIM YEVGENYEVICH;MOORS JOHANNES HUBERTUS JOSEPHINA;SHMAENOK LEONID;SALASHCHENKO NIKOLAY NIKOLAEVITCH |
| 分类号 |
G02B5/20 |
主分类号 |
G02B5/20 |
| 代理机构 |
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代理人 |
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