发明名称 Non-volatile memory device including nitrogen pocket implants and methods for making the same
摘要 In a non-volatile memory structure, the source/drain regions are surrounded by a nitrogen-doped region. As a result, an interface between the substrate and the charge trapping layer above the nitrogen-doped region is passivated by a plurality of nitrogen atoms. The nitrogen atoms can improve data retention, and performance of cycled non-volatile memory devices.
申请公布号 US7638393(B2) 申请公布日期 2009.12.29
申请号 US20060381307 申请日期 2006.05.02
申请人 MACRONIX INTERNATIONAL CO., LTD. 发明人 SHIH YEN-HAO
分类号 H01L21/336 主分类号 H01L21/336
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