| 摘要 |
The invention refers to a method which can be used for pore size reduction, defect repair and in general for improving of the separation properties of microporous and nanoporous membranes. The present chemical vapor infiltration method can be applied at relatively low temperatures (200-300 °C), where it is feasible to use current available sealing technologies. By using this method a microporous membrane, which contains defects and, therefore, it has a low selectivity, can be modified in a controllable way turn to a purely microporous and/or nanoporous membrane of high selectivity. The microporous and nanoporous membranes without defects and with pore sizes less than 1 nm can find important industrial applications, as it is described in the present patent application. These include many gas separation processes, eg H 2 recovery and gas pollutant cleaning, pervaporation and nanofiltration processes, as well as in membrane reactors for conversion enhancement in thermodynamically limited reactions with simultaneous separation of a reaction product. |
