发明名称 METHOD FOR DICING WAFER AND PROCESS FOR MANUFACTURING LIQUID-DISCHARGING HEAD USING THE DICING METHOD
摘要 PROBLEM TO BE SOLVED: To manufacture a semiconductor element having an opening on the side of a front surface in a stable fashion, by reducing sticking residues on the front surface of a wafer of cut waste and the like, which are generated by wafer dicing at the time of cutting. SOLUTION: Wafer dicing is performed for a one-cut line by both directional movements in a two-step cut. At this time, in the going direction a half-cut cut line 100A which cuts deeply into a wafer 101 by down-cut is formed. Furthermore, in the returning direction along the cut line 100A, the remaining work portion and dicing tape are fully cut by up-cut to form a cut line 100B. COPYRIGHT: (C)2010,JPO&INPIT
申请公布号 JP2009302228(A) 申请公布日期 2009.12.24
申请号 JP20080153993 申请日期 2008.06.12
申请人 CANON INC 发明人 YATABE SHOICHI
分类号 H01L21/301;B41J2/16;B81C99/00 主分类号 H01L21/301
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