| 摘要 |
<P>PROBLEM TO BE SOLVED: To provide a method, a system and a computer program product for evaluating placement errors within a lithographic mask. <P>SOLUTION: The method for evaluating placement errors within a lithographic mask includes: providing or receiving a reference result that represents a distance between a reference pair of points of a reference element; measuring for each pair of points out of multiple pairs of points that are associated with multiple spaced apart elements of the lithographic mask, the distance between the pair of points to provide multiple measurement results; wherein differences between a measurement result and the reference result are indicative of relative placement errors; and determining relative placement errors in response to relationships between the reference result and each of the measurement results. <P>COPYRIGHT: (C)2010,JPO&INPIT |
