| 摘要 |
An exposure apparatus (10) for transferring a first mask pattern (29A) from a first mask (26A) and a second mask pattern (29B) from a second mask (26B) to a substrate (28) includes a first mask stage assembly (18A), a second mask stage assembly (18B), an illumination system (14A), a substrate stage assembly (20), and an optical assembly (16). The first mask stage assembly (18A) positions the first mask (26A). The second mask stage assembly (18B) positions the second mask (26B). The illumination system (14A) selectively generates a first illumination beam (32A) that is directed at the first mask (26A) to generate a first pattern beam (38A), and a second illumination beam (32B) that is directed at the second mask (26B) to generate a second pattern beam (38B). The substrate stage assembly (20) positions the substrate (28). The optical assembly (16) can include a first optical inlet (40A) that receives the first pattern beam (38A), a spaced apart second optical inlet (40B) that receives the second pattern beam (38B), and an optical outlet (40C) that directs and focuses the first pattern beam (38A) and the second pattern beam (38B) onto the substrate (28).
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