发明名称 RAISED FACET- AND NON-FACET 3D SOURCE/DRAIN CONTACTS IN MOSFETS
摘要 An apparatus comprising a semiconductor substrate; a conductively doped source or drain (source/drain) region at the surface of the substrate; a raised semiconductor layer deposited over the source/drain region to form a raised source/drain region; a via formed in the raised source/drain region having substantially vertical sidewalls reaching partly or substantially to the source/drain region; and a metal contact filling the via.
申请公布号 US2009315120(A1) 申请公布日期 2009.12.24
申请号 US20080145296 申请日期 2008.06.24
申请人 SHIFREN LUCIAN;ZAWADZKI KEITH;GILES MARTIN;WEBER CORY 发明人 SHIFREN LUCIAN;ZAWADZKI KEITH;GILES MARTIN;WEBER CORY
分类号 H01L29/78;H01L21/336 主分类号 H01L29/78
代理机构 代理人
主权项
地址
您可能感兴趣的专利