发明名称 VACUUM APPARATUS
摘要 PROBLEM TO BE SOLVED: To provide a vacuum apparatus which can shorten a tact time and increase a production quantity. SOLUTION: This vacuum apparatus has an evacuatable chamber 1, and first and second susceptors 11 and 21 which are movably installed in the chamber 1. A treatment chamber 4 is defined by partitioning a part directly under a region formed by one part of the upper part of the chamber 1 with either of the first and second susceptors 11 and 21, and a load lock chamber 7 is defined by partitioning a part directly under a region formed by the other part of the upper part of the chamber 1 with the other one of the first and second susceptors 11 and 21. Either of the first and second susceptors 11 and 21 is transported from a load lock chamber 7 side to a treatment chamber 4 side and the other one of the first and second susceptors 11 and 21 is complementarily transported from the treatment chamber 4 side to the load lock chamber 7 side. Thereby, substrates to be treated 10a to 10c and 20a to 20c mounted on the first and second susceptors 11 and 21 are sequentially treated in the treatment chamber 4. COPYRIGHT: (C)2010,JPO&INPIT
申请公布号 JP2009299173(A) 申请公布日期 2009.12.24
申请号 JP20080158170 申请日期 2008.06.17
申请人 SHIMADZU CORP 发明人 KITAHARA MASARU;SAKAGUCHI SUMUTO;TAKAMI YOSHIO;OKAMOTO HIDEKI
分类号 C23C16/46;C23C14/50;C23C14/56;C23C16/54;H01L21/205;H01L21/31;H01L21/68 主分类号 C23C16/46
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