发明名称 DEVICE FOR FLOATING SUBSTRATE
摘要 PROBLEM TO BE SOLVED: To provide a device for floating a substrate which has a stage adapted to function as a substrate floating table for floating a processing object substrate in the air using a force of pneumatic pressure and which allows improving a consumption efficiency of power usage (compressed air) to float the substrate. SOLUTION: The substrate floating device is provided a multitude of jetting ports 120 on the top surface of a stage 112. For each of the jetting ports 120, there is provided a jet control section 144 within the stage 112 in a configuration of a flow-rate switching valve, in which the jet control section 144 performs port-by-port and automatic switching of a flow rate of air jet depending on a relative position with respect to the substrate G. The jet control section 144 has a valve chest 146 with a spherically formed wall surface and a spherical valving element 148 movably provided within the valve chest 146. In top and bottom portions of the valve chest 146, there are formed an outlet 146a and an inlet 146b, respectively, positioned oppositely to each other in a vertical direction. COPYRIGHT: (C)2010,JPO&INPIT
申请公布号 JP2009302569(A) 申请公布日期 2009.12.24
申请号 JP20090215320 申请日期 2009.09.17
申请人 TOKYO ELECTRON LTD 发明人 YAMAZAKI TAKESHI;MIYAZAKI KAZUHITO;MOTODA KIMIO;TATEYAMA KIYOHISA
分类号 H01L21/683;B05C13/02;H01L21/027 主分类号 H01L21/683
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