| 发明名称 |
CHEMICALLY AMPLIFIED POSITIVE RESIST COMPOSITION |
| 摘要 |
<P>PROBLEM TO BE SOLVED: To provide a chemically amplified positive resist composition producing a pattern excellent in resolution. <P>SOLUTION: The chemically amplified positive resist composition comprises a resin having a repeating unit containing an unstable radical in acid in the side chain and a repeating unit expressed by a formula (I); and an acid generation agent containing fluoromethane sulfonyl anion having an alkyl oxy-carbonyl group. <P>COPYRIGHT: (C)2010,JPO&INPIT |
| 申请公布号 |
JP2009301020(A) |
申请公布日期 |
2009.12.24 |
| 申请号 |
JP20090115310 |
申请日期 |
2009.05.12 |
| 申请人 |
SUMITOMO CHEMICAL CO LTD |
发明人 |
KAMABUCHI AKIRA;YAMAGUCHI NORIFUMI |
| 分类号 |
G03F7/039;C08F20/26;G03F7/004;H01L21/027 |
主分类号 |
G03F7/039 |
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