EXPOSURE APPARATUS, DEVICE MANUFACTURING METHOD, AND METHOD OF MANUFACTURING APERTURE STOP

摘要

PROBLEM TO BE SOLVED: To provide an exposure apparatus that reduces variation in line width of an original pattern formed on a substrate, and to provide a method of manufacturing an aperture stop.

SOLUTION: The exposure apparatus has a light attenuating portion 11c with intermediate transmissivity formed between an aperture 11a and a light shield portion 11b of the aperture stop 11 disposed shifting from a rear-side focal plane 10b of an optical integrator 10 of an illuminating optical system.

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