发明名称 |
MANUFACTURING METHOD OF FERROELECTRIC MEMORY ELEMENT |
摘要 |
<P>PROBLEM TO BE SOLVED: To provide a method for manufacturing an improved ferroelectric memory element by forming a ferroelectric film having an improved crystal orientation. Ž<P>SOLUTION: The manufacturing method of a ferroelectric memory element includes processes of: forming a first electrode 33a in an upper portion of a substrate; forming a titanium film 341 on the first electrode 33a; depositing a product generated by allowing a first organic metal gas to react with a first oxygen gas on the titanium film 341, forming a solid solution composed of the product and the titanium film 341 to form a first ferroelectric film 34a on the first electrode 33a; and forming a second electrode 35a at an upper portion of the first ferroelectric film 34a. Ž<P>COPYRIGHT: (C)2010,JPO&INPIT Ž
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申请公布号 |
JP2009302305(A) |
申请公布日期 |
2009.12.24 |
申请号 |
JP20080155313 |
申请日期 |
2008.06.13 |
申请人 |
SEIKO EPSON CORP;FUJITSU MICROELECTRONICS LTD |
发明人 |
TAMURA HIROAKI;KURASAWA MASAKI;YAMAWAKI HIDEKI |
分类号 |
H01L21/8246;C23C16/40;H01L21/316;H01L27/105 |
主分类号 |
H01L21/8246 |
代理机构 |
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代理人 |
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主权项 |
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地址 |
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