| 摘要 |
<P>PROBLEM TO BE SOLVED: To provide an exposure device that improves perpendicular measurement precision by calculating an error in a perpendicular direction accompanying horizontal driving. <P>SOLUTION: When a substrate stage is positioned in a first area, the same place of a substrate is measured by a first measuring instrument at a plurality of measurement points both before and after the substrate stage is driven horizontally, a first displacement amount in the perpendicular direction accompanying the horizontal driving of the substrate stage in the first area is computed based upon first measurement results obtained using the first measuring instrument, and the first displacement amount is subtracted from the first measurement results to computes numerals representing a surface shape of the substrate; and the numerals representing the surface shape of the substrate are subtracted from a numeral representing perpendicular position of the substrate when the substrate stage is positioned in a second area to compute a second variation amount in the perpendicular direction accompanying the horizontal driving of the substrate stage in the second area, and the perpendicular position of the substrate stage in the second area is controlled based upon the second variation amount. <P>COPYRIGHT: (C)2010,JPO&INPIT |
