| 摘要 |
<P>PROBLEM TO BE SOLVED: To provide a substrate handler, a lithographic apparatus, and a device manufacturing method. <P>SOLUTION: This invention relates to a substrate handler for handling a substrate including a conditioning device for conditioning the substrate. In one embodiment, the substrate handler includes a displacing device configured to displace the substrate in a direction substantially parallel to the support surface wherein the displacing device is configured to displace the substrate during a conditioning process from one conditioning position to one or more other conditioning positions. According to the other embodiment, the substrate handler includes a float device for providing an air bed above a support surface of the substrate handler, the substrate handler is configured to support the substrate on an air bed during conditioning of the substrate. <P>COPYRIGHT: (C)2010,JPO&INPIT |
