发明名称 |
SEMICONDUCTOR DEVICE, MANUFACTURING METHOD OF SEMICONDUCTOR DEVICE, DISPLAY, AND ELECTRONIC APPARATUS |
摘要 |
<P>PROBLEM TO BE SOLVED: To prevent degradation of transistor characteristics and display characteristics by relaxing influence of light entering into a channel part in an optical resonator. Ž<P>SOLUTION: This semiconductor device includes: a gate electrode (first electrode) Trg formed on a glass substrate 40; a semiconductor layer 42 formed on the gate electrode Trg through a gate insulation film (first insulation film) 41; a heat-transfer layer 44 formed through a buffer oxide film (second insulation film) 43 corresponding to a channel region 42a in the semiconductor layer 42; a channel protection film 45 formed to surround the heat-transfer layer 44 on the channel region 42a; and a source electrode (second electrode) Trs and a drain electrode (third electrode) Trd formed on both end sides of the channel region 42a on the semiconductor layer 42. Ž<P>COPYRIGHT: (C)2010,JPO&INPIT Ž
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申请公布号 |
JP2009302273(A) |
申请公布日期 |
2009.12.24 |
申请号 |
JP20080154866 |
申请日期 |
2008.06.13 |
申请人 |
SONY CORP |
发明人 |
SAGAWA HIROSHI |
分类号 |
H01L29/786;H01L21/336;H01L51/50 |
主分类号 |
H01L29/786 |
代理机构 |
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代理人 |
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主权项 |
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地址 |
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