| 摘要 |
PROBLEM TO BE SOLVED: To provide an electrostatic chuck that makes good use of Johnsen-Rahbeck force of high attraction force, the electrostatic chuck suppressing surface roughness even when employing plasma irradiation using halogen gas etc., having small characteristic variation of the electrostatic chuck, and being usable by a plasma processing apparatus for a long time. SOLUTION: The electrostatic chuck includes a ceramic dielectric made of a sintered body containing alumina and titanium oxide, with maximum particle size of segregation bodies of titanium compounds being smaller than average particle size of alumina, the ceramic dielectric having a volume resistivity of 10<SP>8</SP>ΩCm or more and 10<SP>13</SP>ΩCm or less at room temperature. COPYRIGHT: (C)2010,JPO&INPIT |
