| 发明名称 |
APPARATUS FOR PROCESSING SUBSTRATE AND METHOD OF DOING THE SAME |
| 摘要 |
The apparatus for processing a substrate includes a substrate carrier for carrying a substrate, a chemical-applying unit for applying chemical to the substrate, and a gas-applying unit for applying gas atmosphere to the substrate.
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| 申请公布号 |
US2009314741(A1) |
申请公布日期 |
2009.12.24 |
| 申请号 |
US20090548296 |
申请日期 |
2009.08.26 |
| 申请人 |
NEC LCD TECHNOLOGIES, LTD. |
发明人 |
KIDO SHUSAKU |
| 分类号 |
B44C1/22;H01L21/3065;C23F1/00;H01L21/02;H01L21/027;H01L21/304;H01L21/306;H01L21/677;H01L21/68 |
主分类号 |
B44C1/22 |
| 代理机构 |
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代理人 |
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| 主权项 |
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| 地址 |
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