| 摘要 |
A mechanical oscillator which defines a starting point of a cantilever at a front edge of a base and can determine the length of the cantilever without depending on an alignment accuracy and an etching amount, and a fabrication method of the mechanical oscillator. The mechanical oscillator, produced by processing a wafer, comprises a base (101) formed from a substrate supporting an SOI wafer and a structure to be a cantilever (102) which is formed from a silicon thin film of the SOI wafer and is horizontally protruding from the base (101), wherein a part of a buried oxide film (103) between the base (101) and the structure to be a cantilever (102) is removed, and a cantilever (104) starting from the front edge (105) of the base (101) is formed by directly jointing the structure to be a cantilever (102) to a part including at least the front edge (105) of the base (101) where the buried oxide film was removed.
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