发明名称 SCHOTTKY ELECTRODE FOR GALLIUM OXIDE SINGLE CRYSTAL SUBSTRATE, AND METHOD OF MANUFACTURING THE SAME
摘要 <P>PROBLEM TO BE SOLVED: To provide a Schottky electrode for a gallium oxide single crystal substrate which has a superior Schottky property for the gallium oxide single crystal substrate and is obtained in an easy method. Ž<P>SOLUTION: The Schottky electrode for the gallium oxide single crystal substrate is manufactured by coating the gallium oxide single crystal substrate with poly(3,4-ethylenedioxythiophene) poly(styrenesulfonate) (S1) in a spin coating method, and vaporizing a solvent (S2). The gallium oxide single crystal substrate is coated with poly(3,4-ethylenedioxythiophene) poly(styrenesulfonate) to which 4 to 6 wt.% of dimethyl sulfoxide is added to form a thin film, and then the conductivity is improved to form an electrode having a more excellent Schottky property. Ž<P>COPYRIGHT: (C)2010,JPO&INPIT Ž
申请公布号 JP2009302259(A) 申请公布日期 2009.12.24
申请号 JP20080154485 申请日期 2008.06.12
申请人 NIPPON LIGHT METAL CO LTD;KYOTO UNIV 发明人 OHIRA SHIGEO;ARAI NAOKI;FUJITA SHIZUO;OSHIMA TAKAHITO
分类号 H01L31/108 主分类号 H01L31/108
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