| 摘要 |
<P>PROBLEM TO BE SOLVED: To provide a system capable of rapidly detecting detailed information related to the performance of a substrate and a lithographic apparatus. <P>SOLUTION: A property of an extended pattern formed by at least one line generally extending in a first direction is detected. The extended pattern is formed on a substrate or on a substrate table and, preferably, extends over the length of at least 50 times of the width of the line. The extended pattern is focus sensitive. The detection method includes moving the substrate table in a first direction and measuring a property of the extended pattern along the first direction. <P>COPYRIGHT: (C)2010,JPO&INPIT |
