| 摘要 |
<P>PROBLEM TO BE SOLVED: To provide a configuration inspection technique to conduct exact defect inspection even when there are noises between image patterns indicating repeated patterns. Ž<P>SOLUTION: This configuration inspection is a process to estimate the outline of an inspection object pattern and compute the degree of closeness of the inspection object pattern to a right configuration. The inspection object region is divided into separate regions containing each inspection object pattern, and the first configuration inspection is conducted. Next, for the separate regions in which the first configuration inspection was in fail, the second configuration inspection is conducted only to the limited regions, and the estimated outline is corrected. For limiting the outline, the outline of the inspection object pattern which is around the separate regions and in which the first configuration inspection was in fail is used. In the second configuration inspection, an outline where the inspection object pattern contained in the separate regions of the inspection object has the right configuration is estimated based on the inspection object pattern having the right configuration and being in the periphery first. Then, the configuration inspection is conducted as the inspection range on the region containing the estimated outline and being smaller than the whole separate regions. Ž<P>COPYRIGHT: (C)2010,JPO&INPIT Ž
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