发明名称 |
COMPOUND FOR PHOTORESIST, PHOTORESIST SOLUTION, AND ETCHING METHOD USING THE PHOTORESIST SOLUTION |
摘要 |
The present invention relates to a compound for photoresist, selected from the group consisting of a compound comprising an oxonol dye skeleton, a cyanine dye, a styryl dye, a compound comprising a merocyanine dye skeleton, a compound comprising a phthalocyanine dye skeleton, an azo compound, and a complex compound of an azo compound and a metal ion. The present invention further provides a photoresist liquid comprising at least one of the compound for photoresist and a method of etching a surface being processed using the photoresist liquid. |
申请公布号 |
EP2135901(A1) |
申请公布日期 |
2009.12.23 |
申请号 |
EP20080721374 |
申请日期 |
2008.03.05 |
申请人 |
FUJIFILM CORPORATION |
发明人 |
WATANABE, TETSUYA;USAMI, YOSHIHISA |
分类号 |
C09B23/00;C09B29/48;C09B45/14;C09B45/18;C09B45/20;C09B45/48;C09B47/12;C09B47/18;C09B47/20;G03F7/004;G03F7/09;G03F7/36 |
主分类号 |
C09B23/00 |
代理机构 |
|
代理人 |
|
主权项 |
|
地址 |
|