| 摘要 |
The present disclosure concerns a reservoir and application device comprising: an applicator (3) having a stem (5) and a brush (8) at the end of this stem, the brush (8) presenting a largest transversal dimension (L) between 9 and 14 mm, the brush being at least 30 % wider than it is thick in cross section, a reservoir (2) containing the product (P) to be applied, having a wiper member (20) defining a wiper orifice (22) traversed by the brush when it is removed from the reservoir, the diameter (d) of the wiper orifice being between 2.5 and 5.5 mm. |
