发明名称 HIGH VOLTAGE GAN-BASED HETEROJUNCTION TRANSISTOR STRUCTURE AND METHOD OF FORMING SAME
摘要 <p>A semiconductor device includes a substrate, a first active layer disposed over the substrate, and a second active layer disposed on the first active layer. The second active layer has a higher bandgap than the first active layer such that a two-dimensional electron gas layer arises between the first active layer and the second active layer. A flash layer is disposed on the second active layer and source, gate and drain contacts are disposed on the flash layer.</p>
申请公布号 EP2135285(A1) 申请公布日期 2009.12.23
申请号 EP20080732543 申请日期 2008.03.20
申请人 VELOX SEMICONDUCTOR CORPORATION 发明人 MURPHY, MICHAEL;POPHRISTIC, MILAN
分类号 H01L29/778;H01L21/316;H01L21/338;H01L23/29;H01L23/31;H01L29/20 主分类号 H01L29/778
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