发明名称 |
NANO-IMPRINT METHOD AND APPARATUS |
摘要 |
<p>Provided are a nano-imprint method and a nano-imprint apparatus, which can form a pattern highly precisely on a substrate. The nano-imprint method is a method for pushing a template having a pattern of a rugged shape to a substrate having a curable resin applied thereto. The nano-imprint method comprises the measuring step for measuring the positions of those preselected sample measurement points of a predetermined number, which are set for every object regions of the substrate, the calculating step for performing statistical operations using the measurement positions of the sample measurement points as operation parameters thereby to calculate the deformed states of the object regions, the deforming step for deforming the template on the basis of the deformed states of the object regions calculated at the calculating step, and the pushing step for pushing the deformed template onto the object regions.</p> |
申请公布号 |
WO2009153925(A1) |
申请公布日期 |
2009.12.23 |
申请号 |
WO2009JP02503 |
申请日期 |
2009.06.03 |
申请人 |
NIKON CORPORATION;OWA, SOICHI;KAMEYAMA, MASAOMI |
发明人 |
OWA, SOICHI;KAMEYAMA, MASAOMI |
分类号 |
H01L21/027;B29C59/02 |
主分类号 |
H01L21/027 |
代理机构 |
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代理人 |
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地址 |
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