PATTERNING METHOD, DEVICE MANUFACTURING METHOD USING THE PATTERNING METHOD, AND DEVICE

摘要

Provided is a patterning method, wherein a donor substrate, which has a photothermal conversion layer formed on a substrate, a partitioning pattern formed on the photothermal conversion layer and a transfer material existing in the partitioning pattern, is arranged to face a device substrate, and light is applied to the photothermal conversion layer so that at least a part of the transfer material and at least a part of the partitioning pattern are simultaneously heated, thus, the transfer material is transferred onto the device substrate.  Large size and highly accurate fine patterning is made possible without deteriorating characteristics of thin films such as organic EL materials.