发明名称 Method of manufacturing near field light generation element
摘要 A near field light generation element is manufactured by forming a truncated quadrangular pyramid on a substrate by forming an etching mask having a shape the same as but larger than that of a top face of the truncated quadrangular pyramid, and isotropic etching the substrate using the etching mask. Thereafter, metal films are formed on two opposite side faces of the truncated quadrangular pyramid by injecting a vacuum deposition source from a front of each of the faces and a direction parallel to the substrate.
申请公布号 US7635437(B2) 申请公布日期 2009.12.22
申请号 US20060360278 申请日期 2006.02.23
申请人 SEIKO INSTRUMENTS INC. 发明人 HIRATA MASAKAZU;OUMI MANABU;SHIBATA KOICHI
分类号 B29D11/00;B44C1/22;G01Q60/22;G11B7/135;G11B7/22 主分类号 B29D11/00
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