发明名称 |
System and method for providing residual stress test structures |
摘要 |
The invention comprises systems and methods determining residual stress such as that found in interferometric modulators. In one example, a test unit can be configured to indicate residual stress in a film by interferometrically modulating light indicative of an average residual stress in two orthogonal directions of the substrate. The test unit can include a reflective membrane attached to the substrate where membrane is configured as a parallelogram with at least a portion of each side attached to the substrate, and an interferometric cavity formed between a portion of the membrane and a portion of the substrate, and where the membrane is configured to deform based on the residual stress of the film and modulate light indicative of the amount of membrane deformation.
|
申请公布号 |
US7636151(B2) |
申请公布日期 |
2009.12.22 |
申请号 |
US20060453633 |
申请日期 |
2006.06.15 |
申请人 |
QUALCOMM MEMS TECHNOLOGIES, INC. |
发明人 |
KOTHARI MANISH;KOGUT LIOR;CHUI CLARENCE |
分类号 |
G01L1/24;G01B9/02;G01B11/02 |
主分类号 |
G01L1/24 |
代理机构 |
|
代理人 |
|
主权项 |
|
地址 |
|