| 发明名称 |
Displacement measurement systems lithographic apparatus and device manufacturing method |
| 摘要 |
A displacement measurement system configured to provide measurement of the relative displacement of two components in six degrees of freedom with improved consistency and without requiring excessive space.
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| 申请公布号 |
US7636165(B2) |
申请公布日期 |
2009.12.22 |
| 申请号 |
US20060384834 |
申请日期 |
2006.03.21 |
| 申请人 |
ASML NETHERLANDS B.V. |
发明人 |
KLAVER RENATUS GERARDUS;LOOPSTRA ERIK ROELOF;VAN DER PASCH ENGELBERTUS ANTONIUS FRANSISCUS |
| 分类号 |
G01B9/02 |
主分类号 |
G01B9/02 |
| 代理机构 |
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